氢化锆表面电镀铬制备氢渗透阻挡层的研究

Preparation of Hydrogen Permeation Barrier of Chromium Coating Electrodeposited on Zirconium Hydride

  • 摘要: 研究了在氢化锆(H/Zr原子比为l.801)表面通过电镀铬制备氢渗透阻挡层的工艺。结果显示,基体表面经过适当氧化处理后电镀所得铬镀层与基体的结合强度和阻氢性能都有一定的提高;随着电流密度的升高,氢渗透阻挡层孔隙、显微裂纹明显增多;反之,氢渗透阻挡层连续致密。

     

    Abstract: The technology to prepare hydrogen permeation barrier with electrodeposited chromium on zirconium hydride (ratio of H and Zr is 1.801)was investigated.Resultsshowed that with proper oxidizing pretreatment,the bond strength of Cr coating and substrate and the properties of hydrogen permeation barrier were improved. When current density increase, pores micro cracks in the barrier were increased obviously, and conversely, the barrier was continuous and dense.

     

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