摘要:
采用射频磁控反应溅射在单晶Si(100)上沉积了一系列不同Al含量的(Zr,Al)N薄膜,利用能谱仪(EDS)、X射线衍射仪(XRD)、扫描电镜(SEM)和微力学探针对薄膜的成分、结构、力学和抗氧化性能进行了表征。研究结果表明,当Al含量在0%~20.31%(原子分数)之间时,薄膜是B1型(NaCl)单相结构;当Al含量为31.82%时,同时出现B1和B4型(ZnS)双相结构。当Al含量超过36.82%时,以B4结构为主。随着铝含量的增加,薄膜晶面间距减小,晶格常数变小。薄膜的力学性能测试表明,适当的Al含量可以提高薄膜的硬度。随着Al含量的增加,薄膜的抗氧化性能得到改善,对于B1型(Zr,Al)N薄膜,其结构稳定性也得到增强。
Abstract:
(Zr,Al)N coatings with different Al contents were deposited on Si(100) by reactive RF magnetron sputtering method.Energy dispersive spectroscopy,X-ray diffraction,scanning electron microscopy,nanoindentation were employed to investigate the chemical composition,microstructure,mechanical and oxidation resistance properties of the coating film.The results indicate that as the Al content increases,the film structure changes from type B1(NaCl) to B4(ZnS),the lattice distances decrease for both B1 and B4 structure,and the mechanical character of the films increase first,and then decrease,which is related to the change of the structure of the films.The introduction of Al improves the oxidation-resistance of(Zr,Al)N films.
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