以复合材料为基底的ITO薄膜红外隐身特性研究

Infrared Stealth Properties of ITO Films on Polymer Matrix Composites Substrates

  • 摘要: 利用直流磁控溅射法在树脂基复合材料基底上制备了ITO低红外发射率薄膜。选择了低发射率树脂作为基底复合材料的基体树脂。通过对材料表面进行表征、测试材料表面电阻率及红外发射率,研究了材料的红外隐身性能。结果表明,材料的红外发射率随ITO膜表面电阻率的增加先增加,后趋于一定值。

     

    Abstract: Indium-tin oxide(ITO) films were prepared by reactive magnetron sputtering on polymer matrix composites substrates.The resin with the lowest infrared emissivity was selected as the matrix of the composites substrates.The infrared stealth properties of the material were studied by the surface characterization of the material and the test of surface resistivity and infrared emissivity.With increase of the ITO film surface resistivity,the infrared emissivity of the material increases first,then tends to a certain value.

     

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