Abstract: Niobium Target is mainly used for surface engineering materials in the area such as vessel,chemical,LCD,and heat-resisting and corrosion resisting coating film industry.As a sputtered base material,in order to get uniform and consistent films deposited rate,the main requirements for sputtering niobium target are uniform component,applicable particle size and specific crystallized orientation.This article mainly deals with the effect on grain size of niobium target used for sputtering and coating,which is generated by forging,rolling and heating treatment processes in practical production.Through trials,reasonable forging,rolling and heating treatment process are determined,in which the thorough breakage and recrystallization of ingots grain will occur and uniform and consistent isometric crystal texture is obtained with grain size less than 100μm,which satisfies the requirement of grain size and uniform isometric crystal texture for niobium target used for sputtering and coating.