硅烷偶联剂改性纳米SiO<sub>2</sub>的分散性能

硅烷偶联剂改性纳米SiO₂的分散性能

摘要: 用硅烷偶联剂KH-570对纳米SiO₂进行表面改性,用红外光谱仪(IR)、热重(TA)、Zeta电位、SEM、性能测试等对改性纳米SiO₂进行了研究,结果表明,偶联剂KH-570与SiO₂化学结合形成了Si—O—Si键,其附着量约5.8%,结合溶剂水约10.35%;改性纳米SiO₂在乙醇介质中的Zeta电位由-14.9 mV减小到-41.1mV,体系稳定性可达60 h以上;改性SiO₂用作光固化牙科复合树脂的填料,分散性显著提高,其维氏硬度、压缩强度、弹性弯曲强度等性能提高10%以上。

Abstract: Nano-sized SiO₂ was surface modified with silane coupling agent KH-570. The modified nano SiO₂ was studied by means of infrared spectrometer (IR), thermogravimetric (TA), Zeta potential, SEM. The results showed that coupling agent KH-570 and SiO₂ form a Si-O-Si bond with 5. 8% attached amount and 10. 35% of the solvent water; Zeta potential of modified nano SiO₂ in ethanol medium reduced from -14. 9 mV to -41. 1 mV, the system stability can reach more than 60 h. Used as photocureable dental composite resin filler, the dispersion is remarkably improved, the vickers hardness, compression strength, elastic physical properties such as flexural strength increased more than 10%.