溅射钽靶材用高纯钽粉工艺研究

基金项目:

国家863计划项目(2012BAE06B03)

国家科技支撑计划项目(715-005-0140)

详细信息

Study on Production Process of High Pure Tantalum Powder for Tantalum Target

1. Ningxia Orient Tantalum Industry CO., LTD, Shizuishan 753000, China;
2. National Engineering Research Center of Tantalum and Niobium, Shizuishan 753000, China

摘要: 分析了高纯钽粉生产的技术特点,介绍了一种改进的钽靶材用高纯钽粉的生产方法。采用高温脱氢(900~950℃)和低温脱氧(700~800℃)分步进行的工艺,有利于钽粉氧、氢、镁含量及粒度的控制,所得样品兼具低氧和小粒度的特点。采用真空热处理(700~800℃)工艺可以有效除去脱氧后残余的金属镁、酸洗带入的H、F等杂质,确保颗粒不长大,同时使杂质含量得到了很好的控制。
- 钽粉 /
- 钽靶材 /
- 高纯
Abstract: Technical characteristic of high purity tantalum powder production is analyzed, and an improved production method for high purity tantalum powder for tantalum target is introduced. That high-temperature dehydrogenation (900~950 ℃) and low-temperature deoxygenation (700~800 ℃) are conducted at different stages is beneficial to the control of the contents of hydrogen, oxygen and magnesium in the tantalum powder and the tantalum powder particle size, and the tantalum powder is characterized by low content of oxygen and small particle size. The vacuum heat treatment (700~800 ℃) can be adopted to remove residual metal magnesium after the deoxygenation and such impurities as H and F entrained during the pickling, while assuring there is no growing-up of the particles.
- Tantalum /
- powder Tantalum target /
- high purity