Influence of Layer Thickness on Structural and Mechanical Properties of TiN/ZrON Multilayer Films
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摘要: 采用反应磁控溅射技术制备了不同层厚的TiN/ZrON周期结构涂层,研究了层厚变化对TiN/ZrON涂层的晶体结构和力学性能的影响。所制备样品均具有面心立方(FCC)结构,当TiN层厚度为2.8 nm时,样品具有沿(111)取向的结构;当TiN层厚度为5.2 nm时,多层涂层具有明显的(111)、(200)和(220)衍射峰;当在基底上预沉积一层金属层时,多层涂层的晶体结构将不受基底类型的影响。此外, 较薄的ZrON层会有效提升TiN层的结晶能力,从而改变整个涂层的结晶性能。Ti/[TiN(5.2 nm)/ZrON(0.6 nm)]100样品的最高硬度和弹性模量分别为15.3 GPa和202.4 GPa,平均摩擦系数为0.17,耐磨性良好。Abstract: The TiN/ZrON periodic structure films with different layer thicknesses are prepared by reactive magnetron sputtering technique. The effects of layer thickness variation on the crystal structures and mechanical properties of TiN/ZrON coatings are investigated. All the prepared samples possess a face-centered cubic (FCC) structure. The specimen has a TiN (111) orientation structure when the TiN layer thickness is 2.8 nm. When the TiN layer thickness is 5.2 nm, the multilayer films have the obvious (111), (200) and (220) diffraction peaks. It is concluded that the crystal structure of the specimen is not affected by the substrate type when a metal layer is pre-deposited on the substrate. Furthermore, when the thickness of the ZrON layer is thin, the crystallization of the next TiN layer can be effectively promoted. The maximum hardness and elasticity modulus of the Ti/[TiN(5.2 nm)/ZrON(0.6 nm)]100 specimen are 15.3 and 202.4 GPa, respectively, and the friction coefficient is 0.17, demonstrating good abrasive resistance.
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Keywords:
- periodic structure /
- multilayer film /
- TiN /
- ZrON /
- magnetron sputtering
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