ZHANG Zhi-qiang. ITO Sputtering Target Research Situation at Home and Abroad[J]. Development and Application of Materials, 2010, 25(1): 66-68,73. DOI: 10.19515/j.cnki.1003-1545.2010.01.018
Citation: ZHANG Zhi-qiang. ITO Sputtering Target Research Situation at Home and Abroad[J]. Development and Application of Materials, 2010, 25(1): 66-68,73. DOI: 10.19515/j.cnki.1003-1545.2010.01.018
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ITO Sputtering Target Research Situation at Home and Abroad

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  • In this paper,the research progress,manufacturing technology and applications in the domestic market of ITO are reviewed.The physical properties of ITO sputtering target is introduced.
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