JIANG Zi-ran. Fabrication Techniques and Development of ITO Transparent and Conductive Thin Films[J]. Development and Application of Materials, 2010, 25(4): 68-71,86. DOI: 10.19515/j.cnki.1003-1545.2010.04.017
Citation:
JIANG Zi-ran. Fabrication Techniques and Development of ITO Transparent and Conductive Thin Films[J]. Development and Application of Materials, 2010, 25(4): 68-71,86. DOI: 10.19515/j.cnki.1003-1545.2010.04.017
JIANG Zi-ran. Fabrication Techniques and Development of ITO Transparent and Conductive Thin Films[J]. Development and Application of Materials, 2010, 25(4): 68-71,86. DOI: 10.19515/j.cnki.1003-1545.2010.04.017
Citation:
JIANG Zi-ran. Fabrication Techniques and Development of ITO Transparent and Conductive Thin Films[J]. Development and Application of Materials, 2010, 25(4): 68-71,86. DOI: 10.19515/j.cnki.1003-1545.2010.04.017
Fabrication Techniques and Development of ITO Transparent and Conductive Thin Films
The type of transparent and conductive thin films and the properties of ITO films are reviewed briefly.The fabrication techniques of ITO films are summarized and their advantages and disadvantages are compared.Finally,the applications of ITO films are introduced and the further development of ITO thin films is investigated.
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