ZHANG Chun-heng, WU Hong, LI Gui-peng, TONG Lei, WANG Kai, LI Zhao-bo. A Research of Tantalum Plate Applied in Semiconductor Fabrication[J]. Development and Application of Materials, 2010, 25(6): 29-32. DOI: 10.19515/j.cnki.1003-1545.2010.06.008
Citation: ZHANG Chun-heng, WU Hong, LI Gui-peng, TONG Lei, WANG Kai, LI Zhao-bo. A Research of Tantalum Plate Applied in Semiconductor Fabrication[J]. Development and Application of Materials, 2010, 25(6): 29-32. DOI: 10.19515/j.cnki.1003-1545.2010.06.008

A Research of Tantalum Plate Applied in Semiconductor Fabrication

  • Magnetron sputtering absorber plays a role of focus and purification in sputtering process of in semiconductor manufacturing.Since proper texture and flatness and structure of the billet plate are essential to the uniform checkered surface treatment, forging and rolling process are mainly investigated in this paper and the uniform tantalum plate with thickness difference less than 0.15mm and grain size 200~300μm is producted.
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