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CUI Xiaofang, WU Xiaofei, XI Yulin. Study on Nodule-forming Causes of ITO Target During Magnetron Sputtering[J]. Development and Application of Materials, 2020, 35(1): 36-39,51.
Citation: CUI Xiaofang, WU Xiaofei, XI Yulin. Study on Nodule-forming Causes of ITO Target During Magnetron Sputtering[J]. Development and Application of Materials, 2020, 35(1): 36-39,51.
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Study on Nodule-forming Causes of ITO Target During Magnetron Sputtering

  • Luoyang Ship Material Research Institute, Luoyang 471023, China

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  • Received Date: July 04, 2019
  • Available Online: March 17, 2024
    Graphical Abstract
    • Abstract
  • Causes of nodule formation ITO target during sputtering process were studied by SEM. The results showed that cracks, voids and other defects were the causes of nodule formation.
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