Volume 18 Issue 1
Jun.  2024
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ZHOU Liang, CHENG Jiang, ZUO Meng, YANG Zhuoru. Synthesis of Photo Imageable Dielectric Material for BUM Manufacture[J]. Development and Application of Materials, 2003, 18(1): 30-33. DOI: 10.19515/j.cnki.1003-1545.2003.01.009
Citation: ZHOU Liang, CHENG Jiang, ZUO Meng, YANG Zhuoru. Synthesis of Photo Imageable Dielectric Material for BUM Manufacture[J]. Development and Application of Materials, 2003, 18(1): 30-33. DOI: 10.19515/j.cnki.1003-1545.2003.01.009
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Synthesis of Photo Imageable Dielectric Material for BUM Manufacture

  • Research Institute of Chemical Eng., South China Univ. of Tech., Guangzhou 510640, China

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  • Received Date: June 26, 2002
  • Available Online: June 14, 2024
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    • Abstract
  • In this paper,the epoxy acrylate prepolymer was synthesized by the reaction of epoxy resin E-44 and an acrylic acid.The prepolymer was used to form the hard permanent layer in the fabrication of the build-up multilayer printed circuit board.In the synthesis reaction,the influence factors such as reaction temperature,catalyst,inhibitor and dose were investigated.The result showed that the optimized reaction parameters were temperature 90℃,N,N-methyl toluidine catalyzer 1% and hydrochinone inhibitor 0.5%.
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