Volume 31 Issue 4
Mar.  2024
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JU Hongbo, HE Sheng, CHEN Tong, CHEN Min, GUO Liping, YU Lihua, XU Junhua. Effect of Base Pressure on Microstructure,Adhesion Strength and Corrosion Resistance of Ru Films Deposited via Magnetron Sputtering[J]. Development and Application of Materials, 2016, 31(4): 95-98,112. DOI: 10.19515/j.cnki.1003-1545.2016.04.017
Citation: JU Hongbo, HE Sheng, CHEN Tong, CHEN Min, GUO Liping, YU Lihua, XU Junhua. Effect of Base Pressure on Microstructure,Adhesion Strength and Corrosion Resistance of Ru Films Deposited via Magnetron Sputtering[J]. Development and Application of Materials, 2016, 31(4): 95-98,112. DOI: 10.19515/j.cnki.1003-1545.2016.04.017
shu

Effect of Base Pressure on Microstructure,Adhesion Strength and Corrosion Resistance of Ru Films Deposited via Magnetron Sputtering

  • 1. School of Material Science and Engineering, Jiangsu University of Science and Technology, Zhenjiang 212003, China;

  • 2. Jiangsu H. Y. Times Electronic Technology Co., Ltd., Yixing 214200, China

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  • Received Date: January 25, 2016
  • Available Online: March 29, 2024
    Graphical Abstract
    • Abstract
  • Ru films with various base pressures were deposited on the semiconductor heat sink Mo via confocal RF magnetron sputtering and the chemical composition,microstructure,adhesion strength and corrosion resistance property of the films were investigated by EDS,XRD,nano-scratch and electrochemical work station.The results showed that oxygen content in the Ru film,decreasing with the decreasing of the base pressure,was 0%(x) when the base pressure was 6.0 × 10-4Pa.When the base pressure was 6.0 × 10-2Pa,a two-phase structure,consisting of fcc-RuO2 and hcp-Ru,co-existed in the Ru film and the relative mass fraction of fcc-RuO2 in the film was 13.7%.The relative mass fraction of fcc-RuO2 in the film decreased with the decreasing of base pressure.When the base pressure was 6.0 × 10-4Pa,Ru films exhibited a single hcp-Ru structure.The grain size and adhesion strength of Ru films,both of which were influenced by the base pressure,increased with the decrease of base pressure.In addition,electrochemical experiments approved that the corrosion property of Ru film with the base pressure of 6.0 × 10-4Pa was better than that of Mo substrate.
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