Citation: | YANG Shuo, XUE Jianqiang, SHI Linpu. Methods of Extracting and Analyzing of Second-phase of ITO Target[J]. Development and Application of Materials, 2019, 34(1): 45-49. DOI: 10.19515/j.cnki.1003-1545.2019.01.009 |
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[2] | CUI Xiaofang, WU Xiaofei, XI Yulin. Study on Nodule-forming Causes of ITO Target During Magnetron Sputtering[J]. Development and Application of Materials, 2020, 35(1): 36-39,51. |
[3] | CUI Xiaofang, WU Xiaofei, XI Yulin. Study on DC Magnetron Sputtering Coating Process of ITO Target[J]. Development and Application of Materials, 2019, 34(6): 35-39. DOI: 10.19515/j.cnki.1003-1545.2019.06.007 |
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[10] | ZHANG Zhi-qiang. ITO Sputtering Target Research Situation at Home and Abroad[J]. Development and Application of Materials, 2010, 25(1): 66-68,73. DOI: 10.19515/j.cnki.1003-1545.2010.01.018 |