Volume 25 Issue 5
Oct.  2010
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WANG Qun-jiao, ZHANG Yi-bin. The Study on Thermoelectric Properties of (La1-xCax)VO3（0≤x≤1） Films by Combinatorial Pulsed Laser Deposition[J]. Development and Application of Materials, 2010, 25(5): 64-68. DOI: 10.19515/j.cnki.1003-1545.2010.05.018
Citation: WANG Qun-jiao, ZHANG Yi-bin. The Study on Thermoelectric Properties of (La1-xCax)VO3（0≤x≤1） Films by Combinatorial Pulsed Laser Deposition[J]. Development and Application of Materials, 2010, 25(5): 64-68. DOI: 10.19515/j.cnki.1003-1545.2010.05.018
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The Study on Thermoelectric Properties of (La1-xCax)VO3（0≤x≤1） Films by Combinatorial Pulsed Laser Deposition

  • 1. Key Laboratory for electromagnetic processing of Materials, Northeastern University, Shenyang 110004, China;

  • 2. Delegation Office, of PLA in Anshan Steel, Ansan 114000, China

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  • Received Date: February 24, 2010
  • Available Online: March 28, 2024
    Graphical Abstract
    • Abstract
  • La1-xCaxVO3 composition-spread films were fabricated by combinatorial pulsed laser deposition and their thermoelectric properties were evaluated paralelly by the multi-channel thermoelectric measurement system.Concurrent X-ray analysis verified the formation of solid soluted films in the full composition range(0≤x≤1) as judged from the linear variation of the lattice constants.The power coefficient of 0.6 μW/cm K2 was achieved in LaVO3 film at 800℃.Large TE properties in vanadium oxide system can be expected with the change of vanadium ion valence from 3+ to 2+.
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